TRAVIT EBL


Travit EBL screenshot

TRAVIT-EBL software is used to simulate energy deposition and resist development in electron beam lithography. The software is useful for

  • optimizing resist profiles
  • simulating proximity effects, CD-linearity
  • printability of SRAFs and small features
  • verifying the accuracy of proximity corrections

The modeling takes into account resist characteristics, exposure parameters, layout, beam blur, diffusion length in the resist, 2D and 3D point spread function, etc.

The output of the software is:

  • Isolines of the absorbed energy in the resist
  • resist profiles at any time during the development
  • critical dimensions after resist development
  • variation of critical dimensions
  • placement accuracy