Electron Beam Lithography
Electron beam lithography is indispensable parts of top level manufacturing of photomasks and nanofabrication. Our products include simulation tools to understand and optimize electron scattering, energy deposition, charging, heating and resist development. We also sell pattern generators to convert scanning electron microscope into an R&D EBL system.
TRAVIT EBL
TRAVIT EBL is a software used to simulate and optimize electron beam lithography. The software simulates 2D and 3D energy deposition in the resist and the resist development. It is used to analyze and optimize the EBL process, including the printability of features, CD-linearity, the resist profile, optimization of the best dose versus development time, etc. [more...]
DISPLACE
DISPLACE software models the charging and displacement of the electron beam due to charging effects on the target's surface in Electron Beam Lithography. [more...]
TEMPTATION
TEMPTATION predicts temperature rises in electron beam lithography (EBL). Temperature variations lead to changes in resist sensitivity and thus to variations of critical dimensions (CD). This problem is especially important in maskmaking, where the substrate has poor heat conductivity, as well as in direct write EBL, where the speed of writing is extremely high. [more...]
SEM Extension Tools
We sell Pattern Generators designed to extend the fuctionality of Scanning Electron Microscopes. Pattern generators convert SEM into an electron beam lithography system. [more...]