| Company | Products | Services | Experience | Contact |
- TRAVIT
- Xenos
- BEAMETR
- GenISys
- TEMPTATION
- CHARIOT
Products
Modern technology faces a lot of complexity in designing and improving the technological process. We develop software that helps to understand and optimize the technological process. We speak the same language as microelectronic specialists, technologists, metrologists, and physicists. We also develop analytical and numerical models to describe the physics involved in development. Moreover, all the complex physics and math is always hidden behind an easy to use graphical user interface designed to be used by process engineers.
BEAMETR
BEAMETR is a technique to automatically measure electron-beam size. The product includes a piece of silicon with fabricated nano-pattern and software. The method uses spatial frequency analysis of a pattern. Using BEAMETR, the operator takes an image of the pattern; the software reads the image and determines the beam size.
CHARIOT
CHARIOT is an advanced Monte Carlo to simulate signals and images in scanning electron microscopy (SEM). Linewidth measurement and defect inspection benefit from understanding of image formation mechanism. Absorbed dose and charging can be predicted in EBL. Other electron beam technologies can benefit from detailed knowledge of electron scattering in a target. This software employs advanced physical and computational models to comply with required accuracy, especially at low voltage.
TRAVIT
TRAVIT software simulates plasma etch and wet etch. The software predicts etch profile, CDs, and CD-variation for patterns and processes, including microloading effect. TRAVIT software is used to understand and predict wafer etch by simulating complex processes such as spacer patterning technology, MEMS, and maskmaking. The software accepts GDSII pattern, process parameters, and materials as input data.
TEMPTATION (Temperature Simulation)
TEMPTATION predicts temperature rise in electron beam lithography (EBL). Temperature variation leads to change in resist sensitivity and so to variation of critical dimensions (CD). This problem is especially important in maskmaking where the substrate is of poor heat conductivity and in direct write EBL, where the speed of writing is extremely high.
The performance of the software is unparalleled in maskmaking industry. TEMPTATION simulates a task in 3 minutes on PC while the competitive software does it in 28 hours on workstation.
GenISys
GenISys data preparation and modeling software allows for fast layout viewing, access, and processing of layout data. It was designed for easy integration with inspection equipment and DFM software. One specific application is electron beam data-preparation, proximity effect correction, and process modeling for direct write.
Xenos
XeDraw and XPG-2 (XENOS) are pattern generators; they convert an SEM into a lithography system. Attached to a conventional SEM, focused ion-beam, or dual beam tool, it upgrades the system to perform nanolithography or MEMS fabrication.
The XENOS XeDraw 2 is a small system which writes at 10 MHz speed at a high resolution of 50,000x50,000 pixels. Due to an intelligent design of hardware, the system can write complex patterns and curved lines in a continuous mode. XPG-2 is of the same flexibility, but writes at incredible speed of up to 50 MHz!
The hardware comes with user-friendly pattern design software. Options include a beam blanker and a precision stage.