S.Babin, L. Karklin,
Propagation of resist heating mask error to wafer level,
Proc. SPIE v.6349, 2006, p.634950

S.Babin, I.Kuzmin,
EBL resist heating error and its correction,
Proc. SPIE v.6349, 2006, p.634950

S.Babin, A.Kahng, I.Mandoiu, S.Muddu,
"Improving critical dimension accuracy and throughput by subfield scheduling in electron beam mask writing",
J.Vac.Sci.Technol B, 23 (6) 2005, 3094

S. Babin, V. Butomo, I. Kuzmin, H. Yamashita, M. Yamabe,
"Thermal Analysis of Diamond-Like Carbon Membrane Masks in Projection Electron-Beam Lithography",
J.Vac.Sci.Technol B v.22(6) 2004, 3082

Sergey V. Babin ; Andrew B. Kahng ; Ion I. Mandoiu,
Subfield scheduling for throughput maximization in electron-beam photomask fabrication,
Proc. SPIE v.5037, 2003

S. Babin,
Measurement of resist response to heating,
J.Vac.Sci.Technol. B, v.21(1), 2003, p.135

S.Babin, I.Kuzmin,
Throughput optimization of electron-beam lithography in photomask fabrication regarding acceptable accuracy of critical dimensions,
BACUS Photomask'01, Proc. SPIE v.4562, 2001, p.545

S.Babin, I.Kuzmin, C.Mack,
Comprehensive Simulation of Electron-Beam Lithography Processes Using PROLITH/3D and TEMPTATION Software Tools,
Microelectronic Engineering, v. 57, 2000, p. 343

S.Babin, M.Gaevski, S.Konnikov,
Measurement and Simulation of Temperature Dynamics Under Electron Beam,
J.Vac.Sci. Technol., B, v.1, 2001, p.127

Resist heating with different writing strategies in high-throughput maskmaking,
Microelectronic Engineering, 2000

V.Chakarian, F.Raymond, C.Sauer, S.Babin, R.Innes,A.Sagle, U.Hofmann, B.Shamoun, D.Trost, A.Ghanbari, F.Abboud,
System Architecture Choices for an Advanced Mask Writer (100-130 nm),
Proc.SPIE, 1999, v.3873, p. 228

N.Kuwahara, H. Nakagawa, M. Kurihara, N.Hayashi, H.Sano,E.Maruta, T.Takigawa, S.Noguchi,
Preliminary evaluation of proximity effects and resist heating effects observed in high acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication,
PMJ'99, Proc.SPIE, v. 3748 (1999) p. 241

F.Abboud, S.Babin, V.Chakarian, A.Ghanbari, R.Innes,F.Raymond, C.Sauer,
Design Considerations for an Electron-Beam Pattern Generator for 130 nm Generation of Masks,
PMJ'99, Proc.SPIE, v.3748 (1999) p.385

S.Babin, H.Hartmann, I. Kuzmin,
Simulation and Measurement of Resist Heating in Multipass Exposure Using 50 kV Variably Shaped Beam System,
Microelectronic Engineering, v. 46, 1999, p.231

Simulation of resist heating using TEMPTATION software with different models of electron beam energy deposition,
Proc.SPIE, v.3676 (1999) p.536

S.Babin, I.Kuzmin, G.Sergeev,
Software Tool for Temperature Simulation in Electron Beam Lithography: TEMPTATION,
Microelectronic Engineering, v.41/42, (1998) p.191

S. Babin,
Comparison of Writing Strategies Subject to Resist Heating,
Proc.SPIE, v. 3546 (1998) p.389

S.Babin, P.Hudek, I.Kostic, I.Kuzmin,
Comparative study of CD-variation due to proximity effects and resist heating in 30-kV electron lithography,
Proc.SPIE, v.3331 (1998) p.655

S.Babin, I.Kuzmin,
Experimental Verification of TEMPTATION (Temperature Simulation) software tool,
J.Vac.Sci.Technol., B16 (1998), p.3241

Measurement of resist heating in photomask fabrication,
J.Vac.Sci.Technol., B15 (1997), p. 2209

S.Babin, I.Kuzmin, G.Sergeev,
Software for Temperature Simulation (Temptation) in Electron Beam Lithography,
Proc.SPIE, v. 3236, (1997) p.464

S.Babin, P.Hudek, I.Kostic, I.Kuzmin,
CD-variation due to resist heating in 30-kV electron lithography,
Proc.SPIE, v.3048, (1997) p.368

S.Babin, I.Kuzmin,
Simulation of resist heating in electron lithography,
Proc.SPIE, v.3048, (1997) p.374

S.Babin, V.Kozunov, I.Kuzmin,
Advanced model for resist heating effect simulation in electron beam lithography,
Int. Conf."Photomask Technology and Management", Proc. SPIE, v.2884, (1996) p.520