TEMPTATION

Electron Beam Lithography (EBL) is one of the major methods used for pattern generation in microelectronics. In a high throughput EBL, local temperature during writing can become highly nonuniform; thus leading to distortion of critical dimensions.

The TEMPTATION software allows for prediction of resist heating, and can reduce development costs of new technology, or new EBL system. Classical heat transfer equation can not be solved for conditions used in EBL. Known models use different simplifications; the results are as different as 14°C and 750°C for equal conditions. Which one is correct?(Probably, neither.)

TEMPTATION uses an advanced analytic model which takes into account all target layers. The solution is 13-fold integral. Analytic integration, and original algorithms allow for fast numeric simulation. This nalytic model results in no trade-off between speed and accuracy as found in finite elements software.

TEMPTATION simulates a task in 3 minutes on PC while the competitive software does it in 28 hours on workstation. Experimental verification demonstrated excellent results! All complicated math is hidden behind a user friendly interface. Our vision is that the engineer should not spend all of his valuable time on learning all the physics - he merely has to insert the parameters of his process and we shall do the rest.

Temperature rise at required coordinates T(x,y,z,time) is a result of simulation.

TEMPTATION operates in a Windows 95/98/NT/W2K/XP environment and can be easily developed for UNIX platform if necessary; the interface of the software was written in Java. TEMPTATION is a commercially available software tool. Customer support, training, upgrades are provided. Order your Demo CD to see what it is!