Software
 |
Input parameters include the electron beam voltage and current, writing strategy, physical constants of the resist and substrate, and the electron flash composition of the pattern. All these parameters can be introduced through an easy-to-use graphical interface. |
 |
Target
Each layer:
- thickness
- thermal constants (embedded library is available)
- mass density
|
 |
Beam
- accelerating voltage
- beam current density
- proximity parameters
Monte Carlo is available
|
 |
Pattern
- positions and sizes of electron flashes
- their sequence of exposure
- exposure times or doses
- delays between flashes, topological elements, and subfields
|
Simulation Order
There are a few kinds of Orders that can simulate temperature rise T(x, y, z, time)
 |
- over an area at a specified time
- dynamics at specified coordinates
- averaged over flash exposure time
|