Micro- and nano-fabrication
We develop state-of-the-art nanofabrication processes, especially in nanoimprint lithography. Our applications focus on the fabrication of a new class of photonic and custom microelectronic devices. The company runs user projects at Lawrence Berkeley National Laboratory and works closely with foundries and universities.
Our completed and on-going projects have involved the following technologies:
- Nanoimprint lithography with sub_15 nm patterning resolution
- Nanopatterning of functional materials
- Electron beam lithography with minimum feature sizes down to 20 nm
- SEM metrology and inspection
- Photolithography
- Photomask design and fabrication
- Vacuum film deposition
- Reactive ion etch
- Dicing
The development of a product can range in quantities from a prototype to pilot production in the shortest time possible, with minimum overhead expenses.
Recent Publications:
- Step and Repeat UV nanoimprint lithography on pre spin-coated resit film : a promising route for fabricating nanodevices, C. Peroz et al. Nanotechnology 21, 445301 highlighted in Nanotechweb.com
- Digital Planar Holographic spectrometer-on-chip fabricated by Step and Repeat UV nanoimprint lithography on pre-spin coated films, C. Peroz, S. Dhuey, A. Goltsov, M. Volger, B. Harteneck, S. Kopyatev, S. Cabrini, S. Babin, V. Yankov Micro. Elect. Eng. 88, 2092 (2011)
- Nano-scale Silicon Pattern Transfer using cryogenic SF6/O2 chemistry and polymer resist masks, Y. Wu. D. Olynick, A. Goodyear, C. Peroz, S. Dhuey, X. Liang, S. Cabrini, Micro. Elect. Eng. 88, 2785 (2011)
- Digital Optical Spectrometer-on-chip, S. Babin, A. Bugrov, S. Cabrini, S. Dhuey. A. Goltsov, I. Ivonin, E.b. Kley, C. Peroz*, H. Schhmidt, V. Yankov, Applied Physics Let.95 041105 (2009)
