Dry etch

Dry Etch

Understanding and optimizing dry etch, film deposition and other processes require a lot of effort. Modeling helps to understand these processes. Our software simulates the dynamics of the etch profile, including such effects as trenching, footing, dispersion, and microloading. The profile, CDs and CD variation due to dry etch are simulated. The software can also handle complex processes such a double patterning, MEMS etch, etc.


TRAVIT Dry Etch is a software used to simulate plasma etch and film deposition, including the etch profile, CDs, and CD-variation, and takes into account microloading effects. The software can simulate etch and deposition processes in double patterning (spacer patterning technology), maskmaking, and MEMS. [more...]