aBeam Technologies:

Our products help optimize top-level semiconductor processes and nanofabrication

RnD 100 award

aBeam Technologies offers a variety of products to improve semiconductor manufacturing and nanofabrication. Our software aids in the simulation and optimization of nanolithography, mask-making, metrology and defect inspection, as well as in the design and optimization of semiconductor equipment. We also sell SEM functionality extension tools.

Top level maskmaking

Top Level Photomasks

Our software simulates and optimizes electron beam lithography, including charging placement error, resist heating, as well as resist exposure and development. Other products optimize chrome etch and metrology for masks. [more...]

Electron Beam Lithography

Electron Beam Lithography

Our products include simulation tools to understand and optimize electron interactions with materials, electron scattering, charging, heating, energy deposition, etc. [more...]

Dry etch

Dry Etch

Our software simulates the dynamics of etch profiles, including trenching, footing, dispersion, and microloading. The software can also handle complex processes such a double patterning. [more...]

Top level masks

Test Chips

The company manufactures custom test chips and has a variety of off-the-shelf test chips.The sizes are from 5 mm to 300 mm wafers. Minimum feature size for a unique pseudo-random chip is 1.5 nm.

Xenos pattern generator

SEM Functionality Enhancement Tools

Convert your Scanning Electron Microscope into a nanofabrication tool with an advanced pattern generator. You can also add a high accuracy stage and beam blanker. [more...]